Festo Booth: Hall 1, 1st Floor, J3146
Application Areas:
With continuous improvements in semiconductor processes, warpage of wafers or substrates frequently occurs in metrology, wafer bonding, advanced packaging, etc. Although contact (downforce) solutions exist on the market, challenges remain regarding installation space and process requirements. Festo proposes a new “non-contact” solution.
This solution combines Festo’s digital and piezoelectric technologies to achieve extremely precise pressure zoned control. Additionally, we have the capability to deeply collaborate with customers for joint development, providing complete solutions to tackle warpage challenges together.
Application Highlights:
Application Areas:
The flow channel transports to the gluing area for coating, then to the heat pressing station for thermal curing and bonding of products and adhesives. Closed-loop force control modules are used to precisely control pressing force and protect products.
Application Highlights:
Semiconductor Front-End Process Equipment Solutions
Application Areas:
Used in temperature control devices for platform cooling in sputtering and etching processes, requiring high precision and stable temperature.
Application Highlights:
Application Areas:
Load-lock chambers, handling systems, and process chambers in semiconductor or optoelectronic industry coating production lines.
Application Highlights:
Customized Solution:
In semiconductor EFEM wafer transfer equipment, digital control terminal systems and precise piezo control technology for FOUP inert gas filling applications effectively reduce slit/gate valve impact forces during closing, minimize dust and vibration, significantly improving yield and extending valve life.
应用领域:
应用于半导体前段制程中,特殊气体供应以及化学打磨气体控制。
应用亮点:
订制方案:
应用领域:
Load Port / Slide Track Buffer / OHC Purge System / FOUP Stocker
应用亮点:
在半导体行业 N2 Purge 吹净系统中,Festo 的气体控制应用解决方案通过各类传感器和流量控制器配合,实现系统集成设计。借助压电阀精准的比例式控制,实现细致的流量调节,并通过通讯实现数据采集与传输。
定制方案: